Remote plasma assisted pulsed laser deposition of chromium oxide thin films - by Charbel Said Madi
Abstract
Remote Plasma Assisted Pulsed Laser Deposition (RPA-PLD) film growth differs fro m conventional PLD in that laser ablation is carried in a chemically activated o xygen background generated by a plasma source as opposed to deposition in ground state O2 mol
Description
Thesis (M.S.)--American University of Beirut, Department of Physics, 2006.;"Advisor: Dr. Malek Tabbal, Associate Professor, Physics--Member of Committee: Dr. Theodore Christidis, Research Associate, Physics--Member of Committee: Dr. Lara Halaoui, Associat
Bibliography: leaves 80-83
Bibliography: leaves 80-83