Growth of manganese oxide thin films by pulsed laser deposition - by Elissar Suheil Majdalani

dc.contributor.authorMajdalani, Elissar Suheil
dc.contributor.departmentAmerican University of Beirut. Faculty of Arts and Sciences. Department of Physics
dc.date2006
dc.date.accessioned2012-06-13T07:10:22Z
dc.date.available2012-06-13T07:10:22Z
dc.date.issued2006
dc.descriptionThesis (M.S.)--American University of Beirut, Dept. of Physics, 2006.;"Advisor: Dr. Samih Ibser, Associate Professor, Department of Physics--Member of Committee: Dr. Mounib El Eid, Professor, Department of Physics--Member of Committee: Dr. Bilal Kaafarani
dc.descriptionBibliography : leaves 88-91.
dc.description.abstractA KrF excimer laser is used to ablate a pure MnO target to grow manganese oxide thin films on Si (111) substrates. The effect of oxygen pressure and substrate t emperature on the various film properties were investigated. Grazing incidence X -ray diffract
dc.format.extentxii, 91 leaves : ill. (some col.) 30 cm.
dc.identifier.urihttp://hdl.handle.net/10938/7361
dc.language.isoen
dc.relation.ispartofTheses, Dissertations, and Projects
dc.subject.classificationT:004834 AUBNO
dc.subject.lcshThin films
dc.subject.lcshManganese oxides
dc.subject.lcshPulsed laser deposition
dc.titleGrowth of manganese oxide thin films by pulsed laser deposition - by Elissar Suheil Majdalani
dc.typeThesis

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