Amorphous to crystalline phase transition in pulsed laser deposited silicon carbide - by Aurore Joseph Said
Abstract
Silicon carbide thin films are deposited on Si( 100) substrates by ablating a Si C polycrystalline target in vacuum using a focused high power KrF excimer laser. The effect of deposition temperature and laser intensity on the microstructure of the films i
Description
Thesis (M.S.)--Dept. of Physics, AUB, 2004.;"Advisor: Dr. Malek Tabbal, Associate Professor, Physics--Member of Committee: Dr. Theodore Christidis, Associate Professor, Physics--Member of Committee: Dr. Samih Isber, Associate Professor, Physics"
Bibliography: leaves 64-68.
Bibliography: leaves 64-68.