New Antenna Designs to Boost the Plasma Density in Helicon Sources

dc.contributor.authorAli, Rayan Al Sayed
dc.contributor.authorAntar, Ghassan Y.
dc.contributor.authorCostantine, Joseph
dc.contributor.departmentDepartment of Electrical and Computer Engineering
dc.contributor.departmentDepartment of Physics
dc.contributor.facultyMaroun Semaan Faculty of Engineering and Architecture (MSFEA)
dc.contributor.facultyFaculty of Arts and Sciences (FAS)
dc.contributor.institutionAmerican University of Beirut
dc.date.accessioned2025-01-24T11:30:38Z
dc.date.available2025-01-24T11:30:38Z
dc.date.issued2022
dc.description.abstractPlasma can be generated using radio frequency (RF) electromagnetic waves for a large variety of applications, such as energy and propulsion generation. Often, the desire is to achieve higher densities for given input power and helicon sources have demonstrated a high efficiency. The design of the antenna that couples the wave plays a major role in the efficiency of generating the plasma particles. Many geometries were studied and compared, but the relationship between the antenna characteristics and the plasma production is still missing. In this article, we identify the power-law dependence between the plasma density and the Gain of an antenna. The latter is determined using numerical simulations in a vacuum, whereas the former is acquired experimentally. The power-law dependence is obtained using four different antenna elements operating under the same experimental conditions on the Polaris linear plasma device. The design a posteriori of a new inductive antenna with a modified quadrifilar helix topology, exhibits not only a higher gain but also confirms the power law. The confirmation of this law will significantly impact the future of many technologies that leverage helicon plasmas. © 1973-2012 IEEE.
dc.identifier.doihttps://doi.org/10.1109/TPS.2022.3189579
dc.identifier.eid2-s2.0-85135741975
dc.identifier.urihttp://hdl.handle.net/10938/27463
dc.language.isoen
dc.publisherInstitute of Electrical and Electronics Engineers Inc.
dc.relation.ispartofIEEE Transactions on Plasma Science
dc.sourceScopus
dc.subjectAntenna design
dc.subjectAntenna gain
dc.subjectHelicon plasma
dc.subjectMagnetized plasma devices
dc.subjectRadio frequency (rf) antenna
dc.subjectHelical antennas
dc.subjectHelicons
dc.subjectPlasma devices
dc.subjectPlasma sources
dc.subjectAntenna gains
dc.subjectFrequency antennas
dc.subjectHelicon sources
dc.subjectMagnetized plasma device
dc.subjectMagnetized plasmas
dc.subjectRadio frequency antenna
dc.subjectRadiofrequencies
dc.subjectPlasma density
dc.titleNew Antenna Designs to Boost the Plasma Density in Helicon Sources
dc.typeArticle

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