dc.contributor.author |
Said, Aurore Joseph |
dc.date.accessioned |
2012-06-13T07:08:27Z |
dc.date.available |
2012-06-13T07:08:27Z |
dc.date.issued |
2004 |
dc.identifier.uri |
http://hdl.handle.net/10938/6747 |
dc.description |
Thesis (M.S.)--Dept. of Physics, AUB, 2004.;"Advisor: Dr. Malek Tabbal, Associate Professor, Physics--Member of Committee: Dr. Theodore Christidis, Associate Professor, Physics--Member of Committee: Dr. Samih Isber, Associate Professor, Physics" |
dc.description |
Bibliography: leaves 64-68. |
dc.description.abstract |
Silicon carbide thin films are deposited on Si( 100) substrates by ablating a Si C polycrystalline target in vacuum using a focused high power KrF excimer laser. The effect of deposition temperature and laser intensity on the microstructure of the films i |
dc.format.extent |
x, 68 leaves : ill. 30 cm. |
dc.language.iso |
eng |
dc.relation.ispartof |
Theses, Dissertations, and Projects |
dc.subject.classification |
T:004513 AUBNO |
dc.subject.lcsh |
Pulsed laser deposition |
dc.subject.lcsh |
Silicon carbide |
dc.subject.lcsh |
Amorphous substances |
dc.subject.lcsh |
Thin films |
dc.title |
Amorphous to crystalline phase transition in pulsed laser deposited silicon carbide - by Aurore Joseph Said |
dc.type |
Thesis |
dc.contributor.department |
American University of Beirut. Faculty of Arts and Sciences. Department of Physics |