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Amorphous to crystalline phase transition in pulsed laser deposited silicon carbide - by Aurore Joseph Said

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dc.contributor.author Said, Aurore Joseph
dc.date.accessioned 2012-06-13T07:08:27Z
dc.date.available 2012-06-13T07:08:27Z
dc.date.issued 2004
dc.identifier.uri http://hdl.handle.net/10938/6747
dc.description Thesis (M.S.)--Dept. of Physics, AUB, 2004.;"Advisor: Dr. Malek Tabbal, Associate Professor, Physics--Member of Committee: Dr. Theodore Christidis, Associate Professor, Physics--Member of Committee: Dr. Samih Isber, Associate Professor, Physics"
dc.description Bibliography: leaves 64-68.
dc.description.abstract Silicon carbide thin films are deposited on Si( 100) substrates by ablating a Si C polycrystalline target in vacuum using a focused high power KrF excimer laser. The effect of deposition temperature and laser intensity on the microstructure of the films i
dc.format.extent x, 68 leaves : ill. 30 cm.
dc.language.iso eng
dc.relation.ispartof Theses, Dissertations, and Projects
dc.subject.classification T:004513 AUBNO
dc.subject.lcsh Pulsed laser deposition
dc.subject.lcsh Silicon carbide
dc.subject.lcsh Amorphous substances
dc.subject.lcsh Thin films
dc.title Amorphous to crystalline phase transition in pulsed laser deposited silicon carbide - by Aurore Joseph Said
dc.type Thesis
dc.contributor.department American University of Beirut. Faculty of Arts and Sciences. Department of Physics


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