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Remote plasma assisted pulsed laser deposition of chromium oxide thin films - by Charbel Said Madi
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| dc.contributor.author | Madi, Charbel Said |
| dc.date.accessioned | 2012-06-13T07:10:14Z |
| dc.date.available | 2012-06-13T07:10:14Z |
| dc.date.issued | 2006 |
| dc.identifier.uri | http://hdl.handle.net/10938/7328 |
| dc.description | Thesis (M.S.)--American University of Beirut, Department of Physics, 2006.;"Advisor: Dr. Malek Tabbal, Associate Professor, Physics--Member of Committee: Dr. Theodore Christidis, Research Associate, Physics--Member of Committee: Dr. Lara Halaoui, Associat |
| dc.description | Bibliography: leaves 80-83 |
| dc.description.abstract | Remote Plasma Assisted Pulsed Laser Deposition (RPA-PLD) film growth differs fro m conventional PLD in that laser ablation is carried in a chemically activated o xygen background generated by a plasma source as opposed to deposition in ground state O2 mol |
| dc.format.extent | xiii, 83 leaves : ill. (some col.) 30 cm. |
| dc.language.iso | eng |
| dc.relation.ispartof | Theses, Dissertations, and Projects |
| dc.subject.classification | T:004735 AUBNO |
| dc.subject.lcsh | Chromium -- Spectra |
| dc.subject.lcsh | Plasma chemistry |
| dc.subject.lcsh | Thin films |
| dc.title | Remote plasma assisted pulsed laser deposition of chromium oxide thin films - by Charbel Said Madi |
| dc.type | Thesis |
| dc.contributor.department | American University of Beirut. Faculty of Arts and Sciences. Department of Physics |
