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Growth of manganese oxide thin films by pulsed laser deposition - by Elissar Suheil Majdalani

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dc.contributor.author Majdalani, Elissar Suheil
dc.date.accessioned 2012-06-13T07:10:22Z
dc.date.available 2012-06-13T07:10:22Z
dc.date.issued 2006
dc.identifier.uri http://hdl.handle.net/10938/7361
dc.description Thesis (M.S.)--American University of Beirut, Dept. of Physics, 2006.;"Advisor: Dr. Samih Ibser, Associate Professor, Department of Physics--Member of Committee: Dr. Mounib El Eid, Professor, Department of Physics--Member of Committee: Dr. Bilal Kaafarani
dc.description Bibliography : leaves 88-91.
dc.description.abstract A KrF excimer laser is used to ablate a pure MnO target to grow manganese oxide thin films on Si (111) substrates. The effect of oxygen pressure and substrate t emperature on the various film properties were investigated. Grazing incidence X -ray diffract
dc.format.extent xii, 91 leaves : ill. (some col.) 30 cm.
dc.language.iso eng
dc.relation.ispartof Theses, Dissertations, and Projects
dc.subject.classification T:004834 AUBNO
dc.subject.lcsh Thin films
dc.subject.lcsh Manganese oxides
dc.subject.lcsh Pulsed laser deposition
dc.title Growth of manganese oxide thin films by pulsed laser deposition - by Elissar Suheil Majdalani
dc.type Thesis
dc.contributor.department American University of Beirut. Faculty of Arts and Sciences. Department of Physics


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