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Optical emission spectroscopy of oxygen microwave plasma for oxide thin film growth application - by Diala Ali Haidar Ahmad
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| dc.contributor.author | Haidar Ahmad, Diala Ali |
| dc.date.accessioned | 2012-06-13T07:11:17Z |
| dc.date.available | 2012-06-13T07:11:17Z |
| dc.date.issued | 2008 |
| dc.identifier.uri | http://hdl.handle.net/10938/7650 |
| dc.description | Thesis (M.S.)--American University of Beirut, Dept. of Physics, 2008.;"Advisor : Dr. Malek Tabbal, Professor , Physics--Member of Committee : Dr. Mazen Al-Ghoul, Associate Professor ,Chemistry--Member of Committee : Prof.. Mounib El Eid, Professor, Physic |
| dc.description | Bibliography : leaves 68-70. |
| dc.description.abstract | The aim of this thesis was to characterize the oxygen plasma generated by a 2.45 GHz microwave source that is being used for oxide thin film growth. The analysi s was conducted by optical emission spectroscopy in order to measure the product ion of dissoc |
| dc.format.extent | xii, 70 leaves : ill. (some col.) 30 cm. |
| dc.language.iso | eng |
| dc.relation.ispartof | Theses, Dissertations, and Projects |
| dc.subject.classification | T:005119 AUBNO |
| dc.subject.lcsh | Plasma (Ionized gases) |
| dc.subject.lcsh | Spectroscopy |
| dc.subject.lcsh | Thin films |
| dc.title | Optical emission spectroscopy of oxygen microwave plasma for oxide thin film growth application - by Diala Ali Haidar Ahmad |
| dc.type | Thesis |
| dc.contributor.department | American University of Beirut. Faculty of Arts and Sciences. Department of Physics |
